Product Overview
Designed for critical industrial applications, this dual-stage reverse osmosis system achieves extreme ionic and organic purity by routing first-pass permeate directly into a second-stage membrane array, reducing total dissolved solids, silica, and trace compounds to minimal levels while shielding downstream polishing equipment from premature exhaustion.
Key Technical Specifications
|
Parameter |
Operational Range |
|
Permeate Conductivity |
Less than 2.0 uS/cm at 25°C |
|
System Recovery |
75% to 85% |
|
Silica Rejection |
Greater than 99.9% |
|
Operating Pressure |
1.2 MPa to 2.5 MPa |
|
Design Capacity |
5 m³/h to 100 m³/h |
Separation Workflow
Primary Filtration: Pressurized feed water passes through initial polyamide composite elements to remove bulk minerals and suspended organics.
Inter-Stage pH Adjustment: Caustic soda dosing raises the primary permeate pH between 8.5 and 9.0 to ionize weak acids and boron.
Secondary Polishing: The adjusted stream enters secondary high-pressure elements to capture remaining trace contaminants.
Energy Recovery: Concentrate pressure from the primary stage feeds isobaric recovery units to decrease overall power consumption.
Mechanical Configuration
High-Pressure Pumps: Vertical multistage centrifugal units in 316L stainless steel driven by VFD motors.
Pressure Vessels: ASME-compliant stainless steel housings arranged in standard multi-stage configurations.
Chemical Subsystems: Automated injection skids for anti-scalant, sodium bisulfite, and caustic soda.
Instrumentation Unit: Inline sensors tracking pressure, flow, conductivity, and pH across both passes.
Feed Water Parameters
Silt Density Index: SDI15 less than 3.0 measured at system inlet.
Free Chlorine: Less than 0.1 mg/L to prevent membrane oxidation.
Turbidity Limit: Maintained below 1.0 NTU via upstream media.
Iron and Manganese: Restricted under 0.05 mg/L to avoid catalytic fouling.
Downstream Polishing Protection
Ionic Load Reduction: Drops raw water TDS from 500 mg/L down to less than 2 mg/L entering polishing loops.
Silica Control: Limits reactive silica to less than 10 ppb, preventing silica slippage on resin beds.
Organic Reduction: Achieves a 90% reduction in TOC, lowering the burden on downstream UV reactors.
Resin Longevity: Extends the operational window of downstream EDI and mixed-bed columns by over 300%.
Ultrapure Water Integration
Dual-Barrier Defense: Delivers absolute physical separation of microorganisms, particulates, and dissolved minerals.
Scaling Prevention: Strips divalent ions completely to eliminate thermal scaling on downstream equipment.
Resistivity Stability: Stabilizes feed conductivity to secure 18.2 MOhm-cm output at loop discharge.
Operational Redundancy: Interlocked manifolds permit isolated chemical cleaning of individual passes without plant shutdowns.
Industrial Applications
Semiconductor Fabrication: Supplying high-purity makeup water for wafer cleaning and CMP processes.
Pharmaceutical Manufacturing: Pretreatment for purified water and water for injection generation loops.
Power Generation: Producing ultra-low mineralized water for high-pressure utility boilers.
Specialty Chemical Synthesis: Feeding high-purity water for electronic chemical production.
System Selection Criteria
Water Chemistry Analysis: Input complete raw water parameters to determine precise membrane flux rates.
Flow Demand Calculation: Establish continuous peak requirements and average daily usage to size pump motors.
Space Evaluation: Assess skid footprint dimensions, vertical clearance, and pipe routing accessibility.
Utility Verification: Confirm electrical supply voltages, instrument air pressure, and drainage capacities.
Engineering Customizations
Wetted Materials: Upgrade piping to sanitary 316L with internal electro-polishing (Ra less than 0.4 um) and orbital welds.
Membrane Selection: Choose fouling-resistant elements for organic-heavy waters or high-rejection elements for extreme boron limits.
Enclosure Types: Skid-mounted on structural steel, containerized in ISO steel boxes, or built in cleanroom enclosures.
Control Platforms: Integrate Siemens or Allen-Bradley PLCs supporting Modbus TCP or Ethernet/IP communication protocols.
Quality Assurance Protocols
Pressure Testing: Every vessel and manifold undergoes hydrostatic testing at 1.5 times design pressure.
Welding Verification: All stainless steel welds receive visual inspection alongside selective boroscopic or X-ray checks.
Factory Acceptance Testing: Complete electrical continuity checks and dry-run pump alignments executed before crating.
Traceability Records: Material test reports provided for all metallic wetted parts and instrument calibrations.
Frequently Asked Questions
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